6518 2 16342 document 6518 fig9b_10k_120mJ400nm_40mJ600nm.tif image/tiff 82fa4fe58a38ad7b0256d59c84a38571 MD5 1231850 2017-05-18 11:39:04 https://researchdata.bath.ac.uk/363/58/fig9b_10k_120mJ400nm_40mJ600nm.tif 363 58 58 image/tiff other Raw Secondary electron image of holes in resist obtained after double exposure with a 800 nm period linear grating mask and a 1.2 micron period used in Figure 9b en public cc_by

fig9b_10k_120mJ400nm_40mJ600nm.tif

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