6519 2 16344 document 6519 Fig9c_10k_120mJ400nm_45mJ600nm.tif image/tiff 1606f52a1b5b7671634998ba89229201 MD5 1231850 2017-05-18 11:39:07 https://researchdata.bath.ac.uk/363/59/Fig9c_10k_120mJ400nm_45mJ600nm.tif 363 59 59 image/tiff other Raw Secondary electron image of holes in resist obtained after double exposure with a 800 nm period linear grating mask and a 1.2 micron period used in Figure 9c en public cc_by

Fig9c_10k_120mJ400nm_45mJ600nm.tif

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