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        <filename>Figure 1.zip</filename>
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        <mtime>2019-09-25 13:41:54</mtime>
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    <formatdesc>Data of Fig. 1: Dual DTL exposures with single lateral displacement:
- Matlab and csv files of the modelling data.
- SEM pictures of the photoresist after Dual DTL exposure with a 1.5 µm hexagonal period amplitude mask.
- SEM pictures after the e-beam deposition and lift-off process for a Dual DTL with a 1 µm hexagonal period amplitude mask.</formatdesc>
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    <main>Figure 1.zip</main>
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