Dataset for "‘Double’ Displacement Talbot Lithography: fast, wafer-scale, direct-writing of complex periodic nanopatterns"

709 43 11928 3 34729 document 11928 Figure 1.zip application/zip 0f216b527bb5f9e241030a9781f5d6a8 MD5 244409366 2019-09-25 13:41:54 https://researchdata.bath.ac.uk/709/1/Figure%201.zip 709 1 1 application/zip other Data of Fig. 1: Dual DTL exposures with single lateral displacement: - Matlab and csv files of the modelling data. - SEM pictures of the photoresist after Dual DTL exposure with a 1.5 µm hexagonal period amplitude mask. - SEM pictures after the e-beam deposition and lift-off process for a Dual DTL with a 1 µm hexagonal period amplitude mask. en public cc_by

Figure 1.zip

data 11929 2 34731 document 11929 Figure 2.zip application/zip 15cdda9d9364be3e2d53d9b949bd78f5 MD5 589613508 2019-09-25 13:46:32 https://researchdata.bath.ac.uk/709/2/Figure%202.zip 709 2 2 application/zip other Data of Fig. 2: Reduction in pitch to below the incident exposure wavelength: - Matlab and csv files of the modelling data. - SEM pictures of the photoresist after a 3 points and 4 points reduction of pitch process. en public cc_by

Figure 2.zip

data 11930 2 34733 document 11930 Figure3.zip application/zip d2b1082d8954342352cee72822e93b34 MD5 272979057 2019-09-25 13:48:13 https://researchdata.bath.ac.uk/709/3/Figure3.zip 709 3 3 application/zip other Data of Fig. 3: Effect of continuous circular lateral displacements during DTL exposure: - Matlab and csv files of the modelling data. - SEM pictures of the photoresist for each radii. en public cc_by

Figure3.zip

data 11931 3 34735 document 11931 Figure4.zip application/zip b930368c3a3ffc8348da528d2366407e MD5 236862134 2019-09-25 13:48:56 https://researchdata.bath.ac.uk/709/4/Figure4.zip 709 4 4 application/zip other Data of Fig. 4: Creation of various grating patterns from a single hexagonal mask: - Matlab and csv files of the modelling data. - SEM pictures of the photoresist for each displacement. en public cc_by

Figure4.zip

data 11932 3 34737 document 11932 Figure5.zip application/zip dac3e6053a9a6b4ccc00338af1d2246b MD5 169666121 2019-09-25 13:49:40 https://researchdata.bath.ac.uk/709/5/Figure5.zip 709 5 5 application/zip other Data of Fig. 5: Demonstration of complex features: - Matlab and csv files of the modelling data. - SEM pictures of the photoresist for each displacement. en public cc_by

Figure5.zip

data 11972 2 34964 document 11972 readme.docx application/vnd.openxmlformats-officedocument.wordprocessingml.document d0f77e89bea8ce1f4e4fb4df4cc7280d MD5 13721 2019-10-07 13:25:26 https://researchdata.bath.ac.uk/709/6/readme.docx 709 6 6 application/vnd.openxmlformats-officedocument.wordprocessingml.document other Description of the csv files (modelling data). en public cc_by

readme.docx

documentation 11973 1 34968 document 11973 indexcodes.txt text/plain 736215a352ffada2540ae6dcdb8cd14d MD5 181 2019-10-07 13:35:55 https://researchdata.bath.ac.uk/709/7/indexcodes.txt 709 7 7 text/plain other Generate index codes conversion from other to indexcodes en public

indexcodes.txt

http://eprints.org/relation/isVersionOf https://researchdata.bath.ac.uk/id/document/11972 http://eprints.org/relation/isVolatileVersionOf https://researchdata.bath.ac.uk/id/document/11972 http://eprints.org/relation/isIndexCodesVersionOf https://researchdata.bath.ac.uk/id/document/11972 archive 7858 disk0/00/00/07/09 2019-10-23 13:49:51 2024-07-18 12:31:53 2019-10-23 13:49:51 data_collection show Chausse Pierre P.J.P.Chausse@bath.ac.uk University of Bath TRUE Le Boulbar Emmanuel elb43@bath.ac.uk 0000-0001-6364-3976 University of Bath FALSE Coulon Pierre-Marie P.Coulon@bath.ac.uk 0000-0002-9120-7554 University of Bath FALSE Shields Philip P.Shields@bath.ac.uk 0000-0003-0517-132X University of Bath TRUE Dataset for "‘Double’ Displacement Talbot Lithography: fast, wafer-scale, direct-writing of complex periodic nanopatterns" GB0020 HH0020 HH0040 dept_elec_eng This study developed a new low-cost nanolithographic tool for creating periodic arrays of complex, nano-motifs, across large areas within minutes. Displacement Talbot Lithography is combined with lateral nanopositioning to enable large-area patterning with the flexibility of a direct-write system. This enables the creation of different periodic patterns in short timescales using a single mask with no mask degradation. The dataset includes images of Matlab models (in .csv format) and SEM experimental pictures of the different experiments realised (discrete lateral illumination, continuous displacements during one illumination). 2019-10-18 University of Bath public RightsHolder University of Bath Engineering and Physical Sciences Research Council https://doi.org/10.13039/501100000266 EP/M022862/1 Manufacturing of Nano-Engineered III-N Semiconductors - Equipment Engineering and Physical Sciences Research Council https://doi.org/10.13039/501100000266 EP/M015181/1 Manufacturing of Nano-Engineered III-Nitride Semiconductors Secondary electron images were captured using a Hitachi S-4300 scanning electron microscope (SEM). An accelerating voltage of 5 kV was used to collect the images. The modelling has been performed by a code in MATLAB. 2017 2019 en 1 10.15125/BATH-00709 https://doi.org/10.1364/OE.27.032037 pub