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        <mtime>2019-09-25 13:46:32</mtime>
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    <formatdesc>Data of Fig. 2: Reduction in pitch to below the incident exposure wavelength:
- Matlab and csv files of the modelling data.
- SEM pictures of the photoresist after a 3 points and 4 points reduction of pitch process.</formatdesc>
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    <main>Figure 2.zip</main>
    <content>data</content>
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