Dataset for "Displacement Talbot Lithography: an alternative technique to fabricate nanostructured metamaterials"


Le Boulbar, E., 2017. Dataset for "Displacement Talbot Lithography: an alternative technique to fabricate nanostructured metamaterials". University of Bath. https://doi.org/10.15125/BATH-00363.


Dataset abstract

This dataset contains scanning electron microscopy (SEM) secondary electron (SE) images of linear gratings resist, dashes and holes in resist that were obtained using Displacement Talbot lithography. These techniques were used to assess the dimensions of the resist features that were obtained with linear grating mask, using single or double exposure steps. SE images also shows the lift-off profile used in order to obtain metamaterial 'fishnet' like metallic structures. The dimensions of the measured linear gratings, dashes and holes are written in text files.

Title: Dataset for "Displacement Talbot Lithography: an alternative technique to fabricate nanostructured metamaterials"
Subjects: Manufacturing > Design and Testing Technology
Materials processing > Materials Processing
Materials sciences > Materials Characterisation
Optics, photonics and lasers > Lasers and Optics
Optics, photonics and lasers > Optical Devices and Subsystems
Departments: Faculty of Engineering & Design > Electronic & Electrical Engineering
DOI: https://doi.org/10.15125/BATH-00363
URI: https://researchdata.bath.ac.uk/id/eprint/363
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